* High-K Gate Dielectrics: HfO 2, ZrO 2, and Their Silicates
- Author(s):
Nieh, R. Onishi, K. Choi, R. Dharmarajan, E. Gopalan, S. Kang, C.S. Lee, J.C. - Publication title:
- Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2001-9
- Pub. Year:
- 2001
- Page(from):
- 171
- Page(to):
- 182
- Pages:
- 12
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773157 [1566773156]
- Language:
- English
- Call no.:
- E23400/2001-9
- Type:
- Conference Proceedings
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