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Thermally Induced Stress Changes in High Density Plasma Deposited Silicon Nitride Films

Author(s):
Publication title:
Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-7
Pub. Year:
2001
Page(from):
253
Page(to):
263
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773133 [156677313X]
Language:
English
Call no.:
E23400/2001-7
Type:
Conference Proceedings

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