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Material and Process Considerations of Ultra thin Silicon (Oxy) Nitride Films Grown on Silicon and SiO2 Surfaces

Author(s):
D'Emic, C.P.
Gusev, E.P.
Chan, K.K.
Zabel, T.
Copel, M.
Murphy, R.
Kozolowski, P.
Newbury, J.
3 more
Publication title:
Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-7
Pub. Year:
2001
Page(from):
174
Page(to):
190
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773133 [156677313X]
Language:
English
Call no.:
E23400/2001-7
Type:
Conference Proceedings

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