Fate of Fluorine Emissions from NF3-Based CVD Chamber Cleaning Process

Fate of Fluorine Emissions from NF3-Based CVD Chamber Cleaning Process

Author(s):

Vartanian, V. ( (Motorola) )

Goolsby, B. ( (Motorola) )

Mendicino, L. ( (Motorola) )

Brown, PT. ( (Motorola) )

Vires, J. ( (Motorola) )

Raley, D. Babbittand B. ( (Motorola) )

1 more

Publication title:

Environmental Issues with Materials and Processes for the Electronics and Semiconductor Industries : proceedings of the fourth International Symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

2001-6

Pub. Year:

2001

Page(from):

78

Page(to):

93

Pages:

16

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773126 [1566773121]

Language:

English

Call no.:

E23400/2001-6

Type:

Conference Proceedings

Details

TDL ID:	ZA00014010
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Environmental Issues with Materials and Processes in the Electronics and Semiconductor Industries ; Meeting of the Electrochemical Society
Conf. info. (Number):	4th ; 199th
Conf. info. (Venue):	Washington, DC.
Conf. info. (Date):	2001.03.00

Similar Items:

1 Conference Proceedings Impact of Fluorine from NF3 Based Chamber Cleaning Processes Brown, P.T., Mendicino, L., Vartanian, V. Electrochemical Society	7 Conference Proceedings Continuous Real-Time Detection of Molecular Fluorine (F2) Emitted as a By-Product Of CVD and Etch Processes Laush, C., Vartanian, V., Mendicino, L., Brown, P.T. Electrochemical Society
2 Conference Proceedings Characterization of NF3 Chamber Cleans on Multiple CVD Platforms Goolsby, B., Vartanian, V., Mendicino, L., Rivers, J., Vires, J., Soyemi, A., Sun, S.P., Turner, M., Esber, C. Electrochemical Society	8 Conference Proceedings PFC Emissions Reduction and Process Improvements with Remote Plasma CVD Chamber Cleans Mendicino, L., Brown, P.T., Filipiak, S., Nauert, C., Estep, H., Fletcher, M. Electrochemical Society
3 Conference Proceedings Point of Use Abatement Unit By-Pass for NF3-Based CVD Chamber Clean Applications Babbitt, D., Mendicino, L., Vartanian, V., Goolsby, B., Brown, P.T. Electrochemical Society	9 Conference Proceedings Remote Plasma Clean Technology for Dielectric CVD Chamber Cleaning to Reduce PFC Emissions Mendicino, L., Brown, P.T., Filipak, S., Loop, D., Basnett, R., Holber, W., Pearce, R., Johnson, A. Electrochemical Society
4 Conference Proceedings Emissions Characterization of Advanced CVD Processes and Abatement Performance Vartanian, V., Goolsby, B., Reddy, C., Arunachalam, V., Mendicino, L. Electrochemical Society	10 Conference Proceedings Point of Use Abatement for CVD Precursors and Reaction Products Mendicino, L., Brown, P., Vartanian, V., Reid, K., Van Gompel, J. Electrochemical Society
5 Conference Proceedings Characterization and Abatement of Emissions from Advanced CVD Processes Mendicino, L., Vartanian, V., Gonlsby, B., Brown, P.T., Reid, K., Van Gompel, J. Electrochemical Society	11 Conference Proceedings Evaluation of the Applied Materials Remote Clean TM Technology for Lamp Heated CVD Chambers for Perfluorocompound (PFC) Emissions Reduction Mendicino, L., Nauert, C., Flood, J., Brown, P.T., Atherton, A., Nowak, T., Silvetti, D. Electrochemical Society
6 Conference Proceedings The Evaluation of Hexafluoro-1,3-Butadiene as an Environmentally Benign Dielectric Etch Chemistry in a Medium Density Etch Chamber Chatterjee, R., Reif, R., Sparks, I., Vartanian, V., Goolsby, B., Mendicino, L. Electrochemical Society	12 Conference Proceedings Potential Cost of Ownership Reduction for a Nitride Furnace Point of Use Abatement Device Goolsby, B., Vartanian, V., Mendicino, L., Davis, B., Rossow, M. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12