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Plasma Treatment of Hydrogen Silsesquioxane (HSQ) Based Ultra Low-k Films

Author(s):
han, Q.
Waldfried, C.
Berry, I.
Chen, W
Moyer, E.S.
Liii, Y.
Spaulding, M.I.
2 more
Publication title:
Copper Interconnects, New Contact Metallurgies/Structures, and Low-K Interlevel Dielectrics : proceedings of the International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-27
Pub. Year:
2000
Page(from):
184
Page(to):
189
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772945 [156677294X]
Language:
English
Call no.:
E23400/200027
Type:
Conference Proceedings

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