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Ultrathin (EOT < 7A) Ta2O5 Gate Stacks Prepared by an In-Situ RT-MOCVD Process

Author(s):
Lee, S.J.
Luan, H.F.
Lee, C.H
Senzoki, Y
Roberts, D.
Kwong, D.-L.
1 more
Publication title:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-9
Pub. Year:
2000
Page(from):
263
Page(to):
270
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
Language:
English
Call no.:
E23400/2000-9
Type:
Conference Proceedings

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