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High Reliable In Situ Steam Generation Process for 1.5-2.5 nm Gate Oxides

Author(s):
Bidaud, M.
Guyader, F.
Glowacki, F.
Monsieur, F.
Ray, D.
Bruyere, S.
Vincent, E.
Barb, K.
3 more
Publication title:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-9
Pub. Year:
2000
Page(from):
187
Page(to):
194
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
Language:
English
Call no.:
E23400/2000-9
Type:
Conference Proceedings

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