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Exploring Alternative Annealing Methods for Shallow Junction Formation in Ion Implanted Silicon

Author(s):
Jones, K.S.
Banisaukis, H.
Earles, S.
Lindfors, C.
Griglione, M.
Law, M.E.
Taiwar, S.
Falk, S.W.
Downey, D.F.
Agarwal, A.
5 more
Publication title:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-9
Pub. Year:
2000
Page(from):
119
Page(to):
128
Pages:
10
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
Language:
English
Call no.:
E23400/2000-9
Type:
Conference Proceedings

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