Blank Cover Image

High Ramp Rate Rapid Thermal Annealing for Ultra-Shallow Junctions

Author(s):
Kohli, P.
Li, H.-J.
Ganguly, S.
Kirichenko, T.
Murto, B.
Graetz, E.
Zeitzoff, P.
Pawlik, M.
Merrill, P.B.
Banerjee, S.
5 more
Publication title:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-9
Pub. Year:
2000
Page(from):
3
Page(to):
14
Pages:
12
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
Language:
English
Call no.:
E23400/2000-9
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings A study of Ultra-High Ramp rate Thermal Annealing

Li, Hong-Jyh, Kirichenko, Taras A., Ganguly, Swaroop, Kohli, Puneet, McCoy, Steve, Elliott, Kiefer, Sing, David, Torres, …

Electrochemical Society
7 Conference Proceedings Shallow Junction Formation by Low Energy Implant and High Ramp-Up Rate RTA Process

Shishiguchi, S., Mineji, A., Maisuda, T.Y., Kitajima, H.

Electrochemical Society
2 Conference Proceedings Ultra-Shallow Junctions by Ion Implantation and Rapid Thermal Annealing: Spike-Anneals, Ramp Rate Effects

Agarwal, A., Gossmann, H-J., Fiory, A. T.

MRS - Materials Research Society
8 Conference Proceedings Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface

Barnett, Joel, Moumen, N., Gutt, J., Gardner, M., Huffman, C., Majhi, P., Peterson, J.J., Gopalan, S., Foran, B., Li, …

Materials Research Society
3 Conference Proceedings LATERAL UNIFORMITY OF ULTRA-SHALLOW JUNCTIONS FORMED BY RAPID THERMAL ANNEALING IN POLYSILICON-ON-SILICON SYSTEMS

Batra, S., Park, K., Banerjee, S., Smith, T., Mulvaney, B.

Materials Research Society
9 Conference Proceedings Solutions for Ultra-Shallow Junction - Improvements in Spike Annealing

Ramachandran, B., Boas, R., Ramamurthy, S.

Electrochemical Society
4 Conference Proceedings Ultra-Shallow Junctions Formed by Co-Implantation and Sub-Melt Laser Annealing

S. B. Felch, A. Falepin, S. Seven, E. Augendre, T. Noda, V. Parihar, F. Nouri, T. Hoffinann, B. Pawlak, P. Eyben, W. …

Electrochemical Society
10 Conference Proceedings 6 Rapid thermal solid phase epitaxy annealing for ultra-shallow junction formation

Lerch, W., Paul, S., Downey, D. F., Arevalo, E. A.

Electrochemical Society
5 Conference Proceedings Ultra-Shallow N+P and P+N Junction Formation Using Low Energy High Dose As+ and BF2+ Implantation and Rapid Thermal Anneal

Kal,S., Kasko,I., Ryssel,H.

SPIE-The International Society for Optical Engineering, Narosa
11 Conference Proceedings Ultra Shallow p +/n Junctions Fabricated by Plasma Doping and All Solid State Laser Annealing

Tsutsui, K., Sasaki, Y., Jin, C.-G., Tamura, H., Mizuno, B., Higaki, R., Soto, T., Majima, K., Ohmi, S.-I., Iwai, H.

Electrochemical Society
6 Conference Proceedings Ultra-Shallow Junction Formation Using Ion Implantation and Rapid Thermal Annealing: Physical and Practical Limits

Agarwal, A., Gossmann, H.-J.L., Fiory, A.T., Venezia, V.C., Jacobson, D.C.

Electrochemical Society
12 Conference Proceedings Understanding And Modeling Ramp Rate Effects On Shallow Junction Formations

Chakravarthi, Srinivasan, Gencer, Alp H., Dunham, Scott T., Downey, Daniel F.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12