Blank Cover Image

Processing Effects and Electrical Evaluation of ZrO2 Formed by RTP Oxidation of Zr

Author(s):
Nieh, R. ( (University of Texas at Austin) )
Qi, W-J. ( (University of Texas at Austin) )
Lee, B.H. ( (University of Texas at Austin) )
Kang, L. ( (University of Texas at Austin) )
Jeon, Y. ( (University of Texas at Austin) )
Onishi, K. ( (University of Texas at Austin) )
Gopalan, S. ( (University of Texas at Austin) )
Kang, C.S. ( (University of Texas at Austin) )
Dhrarmarajan, E. ( (University of Texas at Austin) )
Choi, R. ( (University of Texas at Austin) )
Lee, J.C. ( (University of Texas at Austin) )
6 more
Publication title:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-5
Pub. Year:
2000
Page(from):
214
Page(to):
221
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772709 [1566772702]
Language:
English
Call no.:
E23400/2000-5
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings * High-K Gate Dielectrics: HfO 2, ZrO 2, and Their Silicates

Nieh, R., Onishi, K., Choi, R., Dharmarajan, E., Gopalan, S., Kang, C.S., Lee, J.C.

Electrochemical Society
7 Conference Proceedings Nitrogen Incorporation and High Temperature Forming Gas Anneal For High-K Gate Dielectrics

J. C. Lee, R. Choi, K. Onishi, N. Cho, C. Kang, Y. Kim, S. Krishnan

Electrochemical Society
2 Conference Proceedings High-K gate dielectrics

Qi,W.-Y., Lee,B.H., Nieh,R., Kang,L., Jeon,Y., Onishi,K., Lee,J.C.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Process Effects and Characterization of Hf-Based Dielectrics

Lee, J.C., Rhee, S., Kang, C., Choi, C., Krishnan, S., Ok, I., Akbar, M., Kim, H., Zhu, F., Zhang, M., Lee, T.

Electrochemical Society
3 Conference Proceedings Study on ZrO2 deposited directly on Si as an alternative gate dielectric material

Qi, Wen-Jie, Nieh, Renee, Lee, Byoung Hun, Jeon, Youngjoo, Kang, Laegu, Onishi, Katsunori, Lee, Jack C.

MRS-Materials Research Society
9 Conference Proceedings Effects of Deformation Strains and Annealing Temperatures on Mechanical Properties of Martensitic Steels

J.C. Lee, U.G. Kang, C.S. Oh, S.J. Kim, W.J. Nam

Trans Tech Publications
4 Conference Proceedings Highly reliable thin hafnium oxide gate dielectric

Kang, Laegu, Lee, Byoung-Hum, Qi, Wen-Jie, Joen, Yong-Joo, Nieh, Rence, Gopalan, Sundar, Onishi, Katsunori, Lee, Jack C.

MRS-Materials Research Society
10 Conference Proceedings Multiple Spike RTP Process for Forming Ultra Thin Oxides for MOS Gate Dielectric Application

Das, J.H., Jia, Y.B., Choi, J.Y., Daniel, A.D., Atanos, A.J., Tay, S.P.

Electrochemical Society
5 Conference Proceedings Nitrogen (N2) Implantation to Suppress Growth of Interfacial Oxide in MOCVD BST and Sputtered BST Films

Nieh, R., Qi, W-J., Jeon, Y., Lee, B. H., Lucas, A., Kang, L., Lee, J. C., Gardner, M., Gilmer, M.

MRS - Materials Research Society
11 Conference Proceedings Microstructure and Formability of Different-Speeds Rolled AZ31 Mg Sheet

J.S. Lee, H.T. Son, Y.K. Kim, I.H. Oh, C.S. Kang, J.C. Bae

Trans Tech Publications
6 Conference Proceedings Ultra-Thin Zirconium Silicate Films With Good Physical and Electrical Properties for Gate Dielectric Applications

Dharmarajan, Easwar, Qi, Wen-Jie, Nieh, Renee, Kang, Laegu, Onishi, Katsunori, Lee, Jack C.

Materials Research Society
12 Conference Proceedings Structural and Electrical Properties of High Pressure Hydrogen Post-Annealed Pt-Er Alloy Metal Gate on HfO2 Film

C. Choi, M. Jang, Y. Kim, M. Jeon, S. Lee, H. Yang, R. Jung, M Chang, H. Hwang

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12