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Ammonia Plasma Passivation Effects on Properties of Post-CMP Low-k Hydrogen Silsesquioxane (HSQ)

Author(s):
Chang, T.-C. ( (National Sun Yat-Sen University) )
Liu, P.-T. ( (National Chiao Tung University) )
Tsai, T.-M. ( (National Tsing Hua University) )
Chang, C.-F. ( (National Chiao Tung University) )
Yang, Y.-L. ( (National Nano Device Laboratory) )
Sze, S.M. ( (National Chiao Tung University) )
Shih, F.Y. ( (Dow Coring Taiwan Inc.) )
Tsai, E. ( (Dow Coring Taiwan Inc.) )
Chen, G. ( (Dow Coring Taiwan Inc.) )
Lee, J.K. ( (Dow Coring Taiwan Inc.) )
5 more
Publication title:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-5
Pub. Year:
2000
Page(from):
133
Page(to):
143
Pages:
11
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772709 [1566772702]
Language:
English
Call no.:
E23400/2000-5
Type:
Conference Proceedings

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