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Characterization of Bulk and Interface Properties of Dielectric Layers and Stacks

Author(s):
Okorn-Schmidt, H.F.
Gusev, E.P.
Buchanan, D.A.
Cartier, E.
Guha, S.
Bojarczuk, N.A.
Rath, D.L.
Callegari, A.
Gribelyuk, M.
Copel, M.
5 more
Publication title:
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2000-2
Pub. Year:
2000
Page(from):
505
Page(to):
512
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772679 [1566772672]
Language:
English
Call no.:
E23400/2000-2
Type:
Conference Proceedings

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