Chemical Structures of Oxynitride/Si(100) Interface
- Author(s):
Takahashi, K. Nohira, H. Kato, H. Tamura, N. Hikazutani, K. Sano, S. Hattori, T. - Publication title:
- The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2000-2
- Pub. Year:
- 2000
- Page(from):
- 181
- Page(to):
- 186
- Pages:
- 6
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772679 [1566772672]
- Language:
- English
- Call no.:
- E23400/2000-2
- Type:
- Conference Proceedings
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