A MECHANISM FOR THE SILICON OXIDE GROWTH BY OZONATED SOLUTIONS

A MECHANISM FOR THE SILICON OXIDE GROWTH BY OZONATED SOLUTIONS

Author(s):

Publication title:

Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

99-36

Pub. Year:

1999

Page(from):

407

Page(to):

415

Pages:

9

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772594 [1566772591]

Language:

English

Call no.:

E23400/99-36

Type:

Conference Proceedings

Details

TDL ID:	ZA00013964
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Conf. info. (Number):	6th
Conf. info. (Venue):	Honolulu, Hawaii, USA
Conf. info. (Date):	1999.10.00

Similar Items:

1 Conference Proceedings THE REMOVAL OF ORGANIC CONTAMINATION BY 03/DI-WATER PROCESSES: A THEORETICAL STUDY De Smedt, F., Vankerckhoven, H., Vinckier, C., De Gendt, S., Claes, M., Heyns., M. Electrochemical Society	7 Conference Proceedings Growth Studies and Reaction Mechanism of the Atomic Layer Deposition of Hafnium Oxide A. Debbie, M. Caymax, S. Brijs, D. Brunco, T. Conard, E. Sleeckx, L. Ragnarsson, S. Van Elshocht, S. De Gendt, M. Heyns Electrochemical Society
2 Conference Proceedings REMOVAL OF PHOTORESIST BY 03 DI-WATER PROCESSES: DETERMINATION OF DEGRADATION PRODUCTS Vankerckhoven, H., De Smedt, F., Vinckier, C., Van Herp, B., Claes, M., De Gendt, S., Heyns, M. Electrochemical Society	8 Conference Proceedings MECHANISMS OF PARTICLE REMOVAL DURING BRUSH SCRUBBER CLEANING Xu, K., Vos, R., Vereecke, G., Mertens, P., Heyns, M., Vinckier, C., Fransaer, J. Electrochemical Society
3 Conference Proceedings EFFICIENCY OF OZONATED DI WATER IN REMOVING ORGANIC CONTAMINATION Kenens, C., De Gendt, S., Knotter, D.M., Loewenstein, L.M., Meuris, M., Vandervorst, W., Heyns, M.M. Electrochemical Society	9 Conference Proceedings APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR Wolke, K., Riedel, T., Haug, R., De Gendt, S., Heyns, M.M., Meuris, M. Electrochemical Society
4 Conference Proceedings OZONATED HF APPLICATIONS IN A SPRAY PROCESSING Claes, M., Rohr, E., De Gendt, S., Lagrange, S., Bergman, E., Heyns, M. Electrochemical Society	10 Conference Proceedings Analysis of Trace Metals in Silicon Nitride Films by a Vapor Phase Decomposition - Solution Collection Approach Vereecke,G., Schaekers,M., Verstraete,K., Amauts,S., Heyns,M.M., Plante,W. SPIE - The International Society for Optical Engineering
5 Conference Proceedings EVALUATION OF OZONATED WATER SPRAY FOR RESIST CLEANING APPLICATIONS De Gendt, S., Lux, M., Claes, M., Van Hoeymissen, J., Conrad, T., Worth, W., Lagrange, S., Bergman, E., Jassal, A.S., … Electrochemical Society	11 Conference Proceedings Inhomogeneous Precipitation of Iron From SC1 Solutions Knotter, D. Martin, Gendt, Stefan de, Mertens, Paul, Heyns, Marc M. MRS - Materials Research Society
6 Conference Proceedings Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon Elshocht, S.Van, Caymax, M., Gendt, S.De, Conard, T., Petry, J., Claes, M., Witters, T., Zhao, C., Brijs, B., Richard, … Materials Research Society	12 Conference Proceedings OPTIMIZATION OF A BRUSH SCRUBBER FOR NANO-SIZED PARTICLES Xu, K., Vos, R., Arnauts, S., Lux, M., Schaetzlein, W., Speh, U., Mertens, P., Heyns, M., Vinckier, C. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12