The Nucleation and Growth of Electrochemically Deposited Copper on PVD Copper and TiN using Alkaline (EDTA and NH 3) Baths

The Nucleation and Growth of Electrochemically Deposited Copper on PVD Copper and TiN using Alkaline (EDTA and NH 3) Baths

Author(s):

Publication title:

Fundamental aspects of electrochemical deposition and dissolution : proceedings of the international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

99-33

Pub. Year:

1999

Page(from):

27

Page(to):

37

Pages:

11

Pub. info.:

Pennington, New Jersey: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772563 [1566772567]

Language:

English

Call no.:

E23400/99-33

Type:

Conference Proceedings

Details

TDL ID:	ZA00013961
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Fundamental Aspects of Electrochemical Deposition and Dissolution
Conf. info. (Number):	1999
Conf. info. (Venue):	Honolulu, HI, USA
Conf. info. (Date):	1999.10.00

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