Blank Cover Image

Gap Filling Cu Electroplating Technology for Damascend ULSI Interconnect Process

Author(s):
Publication title:
Interconnect and contact metallization for ULSI : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-31
Pub. Year:
1999
Page(from):
99
Page(to):
110
Pages:
12
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772549 [1566772540]
Language:
English
Call no.:
E23400/99-31
Type:
Conference Proceedings

Similar Items:

Zhu, M., Papapanayiotou, D., Lee, Y., Ting, C.H.

Electrochemical Society

Spolenak, R., Barr, D.L., Gross, M.E., Evans-Lutterodt, K., Brown, W.L., Tamura, N., Macdowell, A.A., Celestre, R.S., …

Materials Research Society

Ting, C.H., Dubin, V., Cheung, R.

Electrochemical Society

8 Conference Proceedings Copper ULSI Interconnect Technology

Edelstein, D.

MRS - Materials Research Society

Dubin, V. M., Lopatin, S., Chen, S., Cheung, R., Ryu, C., Wong, S. S.

MRS - Materials Research Society

9 Conference Proceedings Electroplating for LIGA Processing

Bonivert, W.D., Hruby, J.M., Hachman, J.T., Kahn Malek, C., Jackson, K. H., Brennan, R.A., Hecht, M.H., Wiberg, D.

Electrochemical Society

Zhu, Mei, Lee, Yi-Fon, Papapanayiotou, Demetrius, Ting, Chiu H.

Electrochemical Society

Dubin, V. M., Morales, G., Ryu, C., Wong, S. S.

MRS - Materials Research Society

Tsai, T.C., flu, S.C., Lin, Z.H., Hsu, S.H., Hsu, C.L., Dai, J., Yang, F., Lin, M.H., Chen, H.C., Hsieh, W.Y.

Electrochemical Society

Lin, M., Chang, C., Huang, T., Lin, H.

Materials Research Society

Spolenak, R., Barr, D.L., Gross, M.E., Evans-Lutterodt, K., Brown, W.L., Tamura, N., Macdowell, A.A., Celestre, R.S., …

Materials Research Society

Klingshirn C, Kunz M, Majumder A F, Oberhauser D, Renner R, Rinker M, Swoboda H-E, Uhrig A, Weber Ch

Plenum Press

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12