Wsi/WsiN/Poly:Si Gate CMOS Technology for 1.0 V DSPs
- Author(s):
Kizilyalli, I. Radosevich, J.R. Merchant, S. Roy, P.K. McKinley, J. Kuehene, S. Bevk, J. Ashton, R. Singh, R. Vaidya, H. Kohler, R. Bocian, B. Freyman, R. - Publication title:
- ULSI process integration : proceedings of the first international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 99-18
- Pub. Year:
- 1999
- Page(from):
- 347
- Page(to):
- 352
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772419 [1566772419]
- Language:
- English
- Call no.:
- E23400/99-18
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
8
Conference Proceedings
Pecision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-Цm CMOS technology
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Manufacturing multilevel metal CMOS with deuterium anneals for improved hot-carrier reliablility
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
5
Conference Proceedings
Specular spectroscopic profilometry for the sub-0.18ヲフm polySi-gate processes
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Alignment mark detection in CMOS materials with SCALPEL e-beam lithography
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |