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0.13 μm CMOS Technology with Optimized Poly-Si/No-Oxide Gate Stack

Author(s):
Kubicek, S.
Jansen, P.
Badenes, G.
Schaekers, M.
Koldyaev, V.
Deferm, L.
De Meyer, K.
Kerr, D.
Naem, A.
4 more
Publication title:
ULSI process integration : proceedings of the first international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-18
Pub. Year:
1999
Page(from):
193
Page(to):
202
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772419 [1566772419]
Language:
English
Call no.:
E23400/99-18
Type:
Conference Proceedings

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