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Electrical Characteristics of Ultra Thin (2.5 nm) Gate Quality LPCVD Nitride/Oxide Films

Author(s):
Publication title:
ULSI process integration : proceedings of the first international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-18
Pub. Year:
1999
Page(from):
181
Page(to):
192
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772419 [1566772419]
Language:
English
Call no.:
E23400/99-18
Type:
Conference Proceedings

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