Silicon Epitaxy and Its Application to RF ICs
- Author(s):
Ohguro, T. Naruse, H. Sugaya, H. Nakamura, S. Sugiyama, N. Morifuji, E. Kimijima, H. Yoshitomi, T. Morimoto, T. Momose, H.S. Katsumata, Y. Iwai, H. - Publication title:
- ULSI process integration : proceedings of the first international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 99-18
- Pub. Year:
- 1999
- Page(from):
- 123
- Page(to):
- 142
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772419 [1566772419]
- Language:
- English
- Call no.:
- E23400/99-18
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Si Channel Surface Dependence of Electrical Characteristics in Ultra-Thin Gate Oxide CMOS*
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
Trans Tech Publications |
SPIE - The International Society for Optical Engineering |
Trans Tech Publications |
Electrochemical Society |
11
Conference Proceedings
Fabrication of Epitaxial Silicides Thin Films by Combining Low-Energy Ion Beam Deposition and Silicon Melecular Beam Epitaxy
MRS - Materials Research Society |
Electrochemical Society |
12
Conference Proceedings
Image compression based on multiresolution decomposition:application to chest radiographs
SPIE-The International Society for Optical Engineering |