Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon | 東京工業大学附属図書館文献データベース

Blank Cover Image

Transient Enhanced Diffusion and Ostwald Ripening of Ion-Implantation Generated Defects in Silicon

Author(s):

Huizing, H.G.A.

van Berkum, J.G.M

Publication title:

Advances in rapid thermal processing : proceedings of the symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

99-10

Pub. Year:

1999

Page(from):

125

Page(to):

132

Pages:

8

Pub. info.:

Pennington, N. J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772327 [156677232X]

Language:

English

Call no.:

E23400/99-10

Type:

Conference Proceedings

Details

TDL ID:	ZA00013940
Series ID:	PA00000028
Conf. info. (Name):	International symposium on advances in rapid thermal processing ; Meeting of Electrochemical Society
Conf. info. (Number):	1999 ; 195th
Conf. info. (Venue):	Seattle, WA, USA
Conf. info. (Date):	1999.05.03-1999.05.06

Similar Items:

1 Conference Proceedings Ostwald Ripening of {113} Defects Precursors and Transient Enhanced Diffusion Mannino, G., Cowern, N. E. B., Stolk, P. A., Roozeboom, F., Huizing, H. G. A., Berkum, J. G. M. van, Boer, W. B. de, … MRS - Materials Research Society	7 Conference Proceedings Concept of Electrically Switchable Reflector Films on the Camber Walls of RTP Reactors Roozeboom, F., van der Sluis, P., Cowern, N.E.B. Electrochemical Society
2 Conference Proceedings Role of Silicon and Boron Interstitial Clusters in Transient Enhanced Diffusion Cowern, N.E.B., Mannino, G., Roozeboom, F., van Berkum, J.G.M, Colombeau, B., Claverie, A. Electrochemical Society	8 Conference Proceedings Shallow Junction Fabrication by Rapid Thermal Outdiffusion from Implanted Oxide Schmirz, I., van Gestel, M., Stolk, P.A., Pononarev, Y.V., Roozeboo, F., Cohayncs, F.N., van Berkum, I.G.M., van de … Electrochemical Society
3 Conference Proceedings The Effect of Oxygen on the Electrical Activation and Diffusion of Ion-Implanted Boron Larsen, K. Kyllesbech, Stolk, P. A., Privitera, V., Berkum, J. G. M. van, Boer, W. B. de, Mannino, G., Cowern, N. E. B., … MRS - Materials Research Society	9 Conference Proceedings Ultrashallow Junction Formation And Gate Activation In Deep-Submicron CMOS Stolk, Peter A., Cubaynes, Florence N., Meyssen, Veerle, Mannino, Giov'anni, Cowern, Nicholas E.B., Zijl, Jeroen van, … Materials Research Society
4 Conference Proceedings TRANSIENT DIFFUSION OF SOPANTS IN SILICON: PHYSICS MODELING, AND PRACTICAL SIMULATIONS Cowern, N.E.B. Electrochemical Society	10 Conference Proceedings Experimental study on the mechanism of carbon diffusion in silicon Cowern, N.E.B., Colombeau, B., Roozeboom, F., Hopstaken, M., Snijders, H., Meunier-Beillard, P., Lerch, W. Materials Research Society
5 Conference Proceedings Low-Energy Implantation and Transient-Enhanced Diffusion: Physical Mechanisms and Technology Implications Cowern, N. E. B., Collart, E. J. H., Politiek, J., Bancken, P. H. L., Berkum, J. G. M. van, Larsen, K. Kyllesbech, … MRS - Materials Research Society	11 Conference Proceedings Diffusion of Ion-Implanted Boron and Silicon in Germanium Uppal, Suresh, Willoughby, A.F.W., Bonar, J.M., Cowern, N.E.B., Morris, R.J.H., Dowsett, M.G. Materials Research Society
6 Conference Proceedings Current Understanding and Modeling of B Diffusion and Activation Anomalies in Preamorphized Ultra-Shallow Junctions Colombeau, B., Smith, A.J., Cowern, N.E.B., Pawlak, B.J., Cristiano, F., Duffy, R., Claverie, A., Ortiz, C.J., Pichler, … Materials Research Society	12 Conference Proceedings Physics-Based Diffusion Simulations for Preamorphized Ultra-Shallow Junctions Cowern, N. E. B., Colombeau, B., Lampin, E., Cristiano, F., Claverie, A., Lamrani, Y., Duffy, R., Venezia, V., Heringa, … Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12