Evaluation of Ultra-Thin Gate Evaluation of Ultra-Thin Gate Stack Dielectrics for 0.1 jim PMOSFETs
- Author(s):
Srivastava, A. Osburn, C.M. Yee, K.F. Heinisch, H.H. Vogel, E.M Abmed, K.Z. Wang, Z. Min, K. TimberJoke, B. Parker, C. Worimnan, J.J. Hauser, J.R. - Publication title:
- Advances in rapid thermal processing : proceedings of the symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 99-10
- Pub. Year:
- 1999
- Page(from):
- 81
- Page(to):
- 88
- Pages:
- 8
- Pub. info.:
- Pennington, N. J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772327 [156677232X]
- Language:
- English
- Call no.:
- E23400/99-10
- Type:
- Conference Proceedings
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