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Recent Developments in Ultratlsin Nitride Gate Stack Prepared by In-Situ RTP Multiprocessing for CMOS ULSI

Author(s):
Song, S.C.
Kini, B.Y.
Loan, H.F.
Kwong, D.-L.
Gardner, M.
Fulford, J.
Wristers, D.
Gelpey, J.
Marcus, S.
4 more
Publication title:
Advances in rapid thermal processing : proceedings of the symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-10
Pub. Year:
1999
Page(from):
45
Page(to):
56
Pages:
12
Pub. info.:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772327 [156677232X]
Language:
English
Call no.:
E23400/99-10
Type:
Conference Proceedings

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