PFC Emissions Reduction and Atomic Fluorine Generation Using C3F8 and Remote CVD Chamber Cleaning Technology

PFC Emissions Reduction and Atomic Fluorine Generation Using C3F8 and Remote CVD Chamber Cleaning Technology

Author(s):

Zazzera, L. ( 3M Company )

Kesari, S. ( 3M Company )

Reagen, W. ( 3M Company )

Tousignant, L. ( 3M Company )

Holber, W. ( AsteX, Inc. )

Chen, X. ( AsteX, Inc. )

1 more

Publication title:

Environmental issues in the electronics and semiconductor industries : proceedings of the second international symposium

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

99-8

Pub. Year:

1999

Page(from):

10

Page(to):

19

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772303 [1566772303]

Language:

English

Call no.:

E23400/99-8

Type:

Conference Proceedings

Details

TDL ID:	ZA00013938
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Environmental Issues with Materials and Processes in the Electronics and Semiconductor Industries ; Meeting of the Electrochemical Society
Conf. info. (Number):	2nd ; 195th
Conf. info. (Venue):	Seattle, WA, USA
Conf. info. (Date):	1999.05.00

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