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Reactive Ion Etching of Ir Films with a TiN Mask in Ar/02/BCl3 Helicon Wave Plasma

Author(s):
Chiang, M.C.
Pan, F.M.
Liu, T.P.
Wei, T.C.
Dai, B.T.
Chien, H.C.
1 more
Publication title:
Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues, proceedings of the fourth International Symposium and Thin Film Materials for Advanced Packaging Technologies : proceedings of the second International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-7
Pub. Year:
1999
Page(from):
114
Page(to):
122
Pages:
9
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772297 [156677229X]
Language:
English
Call no.:
E23400/99-7
Type:
Conference Proceedings

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