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Development of Silicon Nitride Films for Gate Dielectric Applications

Author(s):
Brady, D.
Watt, V.H.C.
Karamcheti, A.
Vishnubhotla, L.
Bersuker, G.
Kim, S.
Zietzoff, P.
Gilmer, M.
Guan, J.
Torres, K.
Nguyen, B.
Williamson, G.
Brown, G.
Gale, G.
Jackson, M.
Huff, H.R.
11 more
Publication title:
Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-6
Pub. Year:
1999
Page(from):
207
Page(to):
218
Pages:
12
Pub. info.:
Pennington, New Jersey: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772280 [1566772281]
Language:
English
Call no.:
E23400/99-6
Type:
Conference Proceedings

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