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Characterization of Hole Trapping in Ultra- Thin Chemical Oxides by Means of X-Ray Photoelectron Spectroscopy Time- Dependent Measurements

Author(s):
Hagimoto, V.
Fujita, T.
Ono, K.
Fujioka, H.
Oshima, M.
Hirose, K.
Tajima, M.
2 more
Publication title:
Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-6
Pub. Year:
1999
Page(from):
134
Page(to):
142
Pages:
9
Pub. info.:
Pennington, New Jersey: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772280 [1566772281]
Language:
English
Call no.:
E23400/99-6
Type:
Conference Proceedings

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