NUMERICAL SIMULATIONS OF SPUTIER DEPOSITION AND ETCHING IN TRENCHES USING THE LEVEL SET TECHNIQUE

NUMERICAL SIMULATIONS OF SPUTIER DEPOSITION AND ETCHING IN TRENCHES USING THE LEVEL SET TECHNIQUE

Author(s):

Publication title:

Proceedings of the Fifth International Symposium of Process Physics and Modeling in Semiconductor Technology

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

99-2

Pub. Year:

1999

Page(from):

220

Page(to):

223

Pages:

4

Pub. info.:

Pennington, New Jersey: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772242 [1566772249]

Language:

English

Call no.:

E23400/99-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013932
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Process Physics and Modeling in Semiconductor Technology ; Spring Meeting of the Electrochemical Society
Conf. info. (Number):	5th ; 195th
Conf. info. (Venue):	Seattle, Washington, USA
Conf. info. (Date):	1999.05.05-1999.05.06

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