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Influence of Boron Doping on Oxide Precipitate Nucleation and Gettering of Iron Impurities in Low Thermal Budget Processing of Czochralski Silicon

Author(s):
Kissinger, G.
Vanhellemont, J.
Morgenstern, G.
Blietz, M.
Tittelbach-Helmrich, K.
Obermejer, G.
Wahlich, R.
2 more
Publication title:
Proceedings of the Third International Symposium on Defects in Silicon
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
99-1
Pub. Year:
1999
Page(from):
268
Page(to):
279
Pages:
12
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772235 [1566772230]
Language:
English
Call no.:
E23400/99-1
Type:
Conference Proceedings

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