Atomic-Scale Modeling of Plasma-Surface Interactions in the PECVD of Silicon

Atomic-Scale Modeling of Plasma-Surface Interactions in the PECVD of Silicon

Author(s):

Publication title:

Proceedings of the Symposium on Fundamental Gas-phase and Surface Chemistry of Vapor-phase Materials Synthesis

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

98-23

Pub. Year:

1998

Page(from):

179

Page(to):

190

Pages:

12

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772174 [1566772176]

Language:

English

Call no.:

E23400/98-23

Type:

Conference Proceedings

Details

TDL ID:	ZA00013926
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Fundamental Gas-phase and Surface Chemistry of Vapor-phase Materials Synthesis
Conf. info. (Number):	1st
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1998.00.00

Similar Items:

1 Conference Proceedings Computational Atomic-Scale Study of the Reactivity of Molecular Fragments from SiH4/H2 Plasma with Amorphous Silicon Surfaces Ramalingam, S., Lopez, A., Maroudas, D., Aydil, E.S. Electrochemical Society	7 Conference Proceedings 56d. Surface Smoothening Mechanism of Plasma-Deposited Amorphous Silicon Thin Films Mayur S. Valipa, Tamas Bakos, Eray S. Aydil, Dimitrios Maroudas American Institute of Chemical Engineers
2 Conference Proceedings Atomic-Scale Analysis of the Reactivity of Radicals from Silane/Hydrogen Plasmas With silicon Surfaces Ramalingam, Shyam., Maroudas, Dimitrios., Aydil, Eray S. MRS - Materials Research Society	8 Conference Proceedings 208e. Atomic-Scale Analysis of the Interactions Between Atomic Hydrogen and Multi-Walled Carbon Nanotubes Andre R. Muniz, Tejinder Singh, Michael J. Behr, Eray S. Aydil, Dimitrios Maroudas American Institute of Chemical Engineers
3 Conference Proceedings Atomic-Scale Analysis of Plasma-Enhanced Chemical Vapor Deposition from SiH4/H2 Plasmas on Si Substrates Ramalingam, Shyam, Maroudas, Dimitrios, Aydil, Eray S. MRS - Materials Research Society	9 Conference Proceedings Effect of H2 Addition on Surface Reactions During CF4/H2 Plasma Etching of Silicon and Silicon Dioxide Films Marra, D.C., Aydil, E.S. Electrochemical Society
4 Conference Proceedings 564b. Atomic-Scale Analysis of Radical Precursor and Hydrogen Surface Diffusion on Plasma-Deposited Amorphous Silicon Thin Films Mayur S. Valipa, Tamas Bakos, Eray S. Aydil, Dimitrios Maroudas American Institute of Chemical Engineers	10 Conference Proceedings 446b. Atomic-Scale Analysis Of The Role Of Surface Cordination Defects In The Growth Of Amorphous Silicon Thin Films Mayur S. Valipa, Tejinder Singh, Dimitrios Maroudas American Institute of Chemical Engineers
5 Conference Proceedings The Role of SiH3 Diffusion in Determining the Surface Smoothness of Plasma-Deposited Amorphous Si Thin Films: An Atomic-Scale Analysis Valipa, S. Mayur, Bakos, Tamas, Aydil, Eray S., Maroudas, Dimitrios Materials Research Society	11 Conference Proceedings 127c. Modeling Plasma-Surface Interactions and Their Role in Inducing Structural Transitions Dimitrios Maroudas American Institute of Chemical Engineers
6 Conference Proceedings Atomic-Scale Analysis of Silicon Hydride Dissociation on Surfaces of Plasma-Deposited Amorphous Silicon Thin Films Mayur S. Valipa, Tejinder Singh, Dimitrios Maroudas American Institute of Chemical Engineers	12 Conference Proceedings 310c. Modeling Plasma-Surface Interactions and Their Role In Inducing Structural Transitions In Materials Dimitrios Maroudas American Institute of Chemical Engineers

1

2

3

4

5

6

7

8

9

10

11

12