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Characterization of RTCVD Grown Si Films on SiO 2 for Nanotechnology Applications

Author(s):
Publication title:
Proceedings of the Fifth International Symposium on Quantum Confinement : nanostructures
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-19
Pub. Year:
1998
Page(from):
27
Page(to):
39
Pages:
13
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772136 [1566772133]
Language:
English
Call no.:
E23400/98-19
Type:
Conference Proceedings

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