Effect of Trace Amounts of Al Surface Contamination on Oxidation Growth Kinetics of Ultrathin Gate Oxides

Effect of Trace Amounts of Al Surface Contamination on Oxidation Growth Kinetics of Ultrathin Gate Oxides

Author(s):

Publication title:

Proceedings of the Fifth International Symposium on High Purity Silicon V

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

98-13

Pub. Year:

1998

Page(from):

264

Page(to):

271

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772075 [1566772079]

Language:

English

Call no.:

E23400/98-13

Type:

Conference Proceedings

Details

TDL ID:	ZA00013916
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on High Purity Silicon ; Meeting of the Elecrochemical Society
Conf. info. (Number):	5th ; 194th
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1998.11.02-1998.11.06

Similar Items:

1 Conference Proceedings REMOVAL OF Cu FROM Si WAFER SURFACES USING DILUTE HF-HC1 SOLUTIONS Dhanda, S., Chiarello, R.P., Helms, C.R., Gupta, P. Electrochemical Society	7 Conference Proceedings TXRF CHARACTERIZATION OF TRACE METAL CONTAMINATION IN THIN GATE OXIDES . Hockett, R.S., Hymes, Diane Materials Research Society
2 Conference Proceedings Fe REMOVAL IN SC2 SOLUTIONS Dhanda, S., Chiarello, R.P., Helms, C.R., Gupta, P. Electrochemical Society	8 Conference Proceedings 11 Place-Exchange Mechanism of Pt(111) Oxidation/Reduction as Observed by Synchrotron X-Ray Scattering You, H., Nagy, Z., Zurawski, D.J., Chiarello, R.P. Electrochemical Society
3 Conference Proceedings THICKNESS DEPENDENT SENSITIVITY OF GATE OXIDES TO SURFACE CONTAMINATION Ridley, R., Wu, C.-T., Roman, P., Dolny, G., Grebs, T., Stensney, F., Ruzyllo, J. Electrochemical Society	9 Conference Proceedings Effect of Growth Conditions on the Reliability of Ultrathin MOS Gate Oxides Yang, Tien-Chun, Saraswat, Krishna C. MRS - Materials Research Society
4 Conference Proceedings Remote plasma nitrided oxides for ultrathin gate dielectric applications (Invited Paper) Hattangady,S.V., Grider,O.T., Kraft,R., Shiau,W.-T., Douglas,M.A., Nicollian,P., Rodder,M., Brown,G.A., Chatterjee,A., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings The Effect of Surface Contamination on Avalanche Breakdown in Recessed Al-Gate GaAs MESFETs Hattori, R., Kuragaki, T., Sato, K., Takano, H., Otsubo, M., Mitsui, S. Electrochemical Society
5 Conference Proceedings Optimization of Post Sulfuric Acid/Hydrogen Peroxide Dump Rinsing Processes Chiarello, R. P., Parker, R., Helms, C. R., Chen, W., Tang, S., Cook, L. J. MRS - Materials Research Society	11 Conference Proceedings 36 Ultrathin plasma nitrided oxide gate dielectrics for sub-100 nm generation CMOS technology Jioon, J., Yeh, P., En, B., Wieczorek, K., Graetscl, F, Bernard, J., Kim, H.S., Ihok, F., Olsen, C., Zhao, R., Ogle, B. Electrochemical Society
6 Conference Proceedings EFFECT OF SURFACE IRON ON GATE OXIDE INTEGRITY AND ITS REMOVAL FROM SILICON SURFACES Park, Heungsoo, Helms, C. R., Ko, Daehong, Tran, M., Triplett, B. B. MRS - Materials Research Society	12 Conference Proceedings Progress in Novel Oxides for Gate Dielectrics And Surface Passivation of GaN/AlGaN Heterostructure Field Effect Transistors Abernathy, C.R., Gila, B.P., Onstine, A.H., Pearton, S.J., Kim, J., Luo, B., Mehandru, R., Ran, F., Gillespie, J.K., … Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12