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High Density Plasma (HDP) Oxide Etching with Reduced Global Warming Emission Using 2H-Heptafluoropropane

Author(s):
Pruette, L.
Karecki, S.
Reif, R.
Sparks, T.
Beu, L.
Vartanian, V.
1 more
Publication title:
Environmental issues in the electronics/semiconductor industries and electrochemical/photochemical methods for pollution abatement
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-5
Pub. Year:
1998
Page(from):
58
Page(to):
62
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771993 [1566771994]
Language:
English
Call no.:
E23400/98-5
Type:
Conference Proceedings

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