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The Integration of Low K Hydrogen Silsesquioxanes (HSQ) in Sub 0.35 (m) Processes

Author(s):
Meynan, H.
Uttecht, R.
Gao, T.
Vanhove, M.
Vanhaelemecrsch, S.
Maex, K.
1 more
Publication title:
Dielectric material integration for microelectronics
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
98-3
Pub. Year:
1998
Page(from):
29
Page(to):
42
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771979 [1566771978]
Language:
English
Call no.:
E23400/98-3
Type:
Conference Proceedings

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