Blank Cover Image

APPLICABILITY OF HF SOLUTIONS FOR CONTACT HOLE CLEANING ON TOP OF TiSi2

Author(s):
Publication title:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-35
Pub. Year:
1997
Page(from):
602
Page(to):
609
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771887 [1566771889]
Language:
English
Call no.:
E23400/97-35
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings IN-LINE MONITORING OF HF-LAST CLEANING OF IMPLANTED AND NON-IMPLANTED SILICON SURFACES BY NON-CONTACT SURFACE CHARGE MEASUREMENTS

Kondoh, E., Trauwaert, M.-A., Heyns, M., Maex, K.

Electrochemical Society
7 Conference Proceedings Finite-Element Simulations of the Mechanical Stress in and Around Narrow TiSi2 Lines

Steegen, A., Wolf, I. De, Maex, K., Ignat, M.

MRS - Materials Research Society
2 Conference Proceedings Plasma Etching of Organic Low-Dielectric-Constant Polymers: Comparative Analysis

Baklanov, M. R., Vanhaelemeersch, S., Alaerts, C., Maex, K.

MRS - Materials Research Society
8 Conference Proceedings REMOVAL OF POLYMERIC/SILICATE RESIDUES AND REDUCTION OF CONTACT RESISTANCE FOR INTER-METAL VIA HOLES BY VAPOR PHASE HF CLEANING

Tong, J.K., Martin, J.S., Rogers, T.C., Syverson, D.J.

Electrochemical Society
3 Conference Proceedings EFFICIENT CLEANING OF LOW-к MATERIALS USING SINGLE-WAFER CLEANING SOLUTION: A COMPATIBILITY STUDY AND ELECTRICAL CHARACTERIZATION

Q. T. Le, J. Van Olmen, R. Vanderheyden, E. Kesters, K. Kenis, T. Conard, W. Boullart, M. R. Baklanov, S. …

Electrochemical Society
9 Conference Proceedings In Situ Oxygen Monitoring of Rapid Thermal Process Chamber: Diagnosis of Gas Flow Dynamics and Wafer Processing

Kondoh, E., Maex, K.

MRS - Materials Research Society
4 Conference Proceedings THE FORMATION AND REMOVAL OF RESIDUE FORMED DURING TiN FLUOROCARBON PLASMA ETCHING

Kim, Y.B., Conard, T., Vanhaeren, D., Baklanov, M., Vanhaelemeersch, S., Vandervorst, W., Maex, K.

Electrochemical Society
10 Conference Proceedings The random contact hole solutions for future technology nodes

A. Chen, S. Hansen, M. Moers, J. Shieh, A. Engelen, K. van I. Schenau, S. Tseng

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Curing Study Of Hydrogen Silsesquioxane Under H2N2 Ambient

Donaton, R.A., Coenegrachts, B., Sleeckx, E., Schaekers, M., Sophie, G., Matsuki, N., Baklanov, M.R., Struyf, H., …

Materials Research Society
11 Conference Proceedings GEOMETRICAL EFFECTS AND DISINTEGRATION OF NARROW TiSi2 /POLY-Si LINES

Norstom, H., Maex, K., Vandenabeele, P.

Materials Research Society
6 Conference Proceedings Surface Modification of Porous Low-k Dielectrics

Boullart, W., Vanhaelemeersch, S., Maex, K.

Electrochemical Society
12 Conference Proceedings GEOMETRICAL EFFECTS AND DISINTEGRATION OF NARROW TiSi2/POLY-Si LINES

Norstrom, H., Maex, K., Vandenabeele, P.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12