Si3N4 PARTICLE REMOVAL EFFICIENCY STUDIES

Si3N4 PARTICLE REMOVAL EFFICIENCY STUDIES

Author(s):

Publication title:

Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

97-35

Pub. Year:

1997

Page(from):

552

Page(to):

559

Pages:

8

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771887 [1566771889]

Language:

English

Call no.:

E23400/97-35

Type:

Conference Proceedings

Details

TDL ID:	ZA00013897
Series ID:	PA00000028
Conf. info. (Name):	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
Conf. info. (Number):	5th ; 192th
Conf. info. (Venue):	Paris, France
Conf. info. (Date):	1997.09.00

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