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Mechanism of Polycrystalline Silicon Etching in a Fluorocarbon Plasma

Author(s):
Publication title:
Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-30
Pub. Year:
1997
Page(from):
1
Page(to):
11
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771832 [1566771838]
Language:
English
Call no.:
E23400/97-30
Type:
Conference Proceedings

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