66. Silicon Surface Etching with High Resolution Using the Confined Etchant Layer Technique

66. Silicon Surface Etching with High Resolution Using the Confined Etchant Layer Technique

Author(s):

Zu, Y.B.

Publication title:

Proceedings of the Symposium on Fundamental Aspects of Electrochemical Deposition and Dissolution Including Modeling

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

97-27

Pub. Year:

1997

Page(from):

605

Page(to):

608

Pages:

4

Pub. info.:

Pennington, New Jersey: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771801 [1566771803]

Language:

English

Call no.:

E23400/97-27

Type:

Conference Proceedings

Details

TDL ID:	ZA00013889
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Fundamental Aspects of Electrochemical Deposition and Dissolution Including Modeling ; Joint International Meetong of the Electrochemical Society and the International Society of Electrochemistry
Conf. info. (Number):	1997 ; 1997
Conf. info. (Venue):	Paris, France
Conf. info. (Date):	1997.00.00

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