The Barrier Characteristics of Chemical Vapor Deposited Amorphous Tungsten with In Situ Nitrogen Plasma Treatment

The Barrier Characteristics of Chemical Vapor Deposited Amorphous Tungsten with In Situ Nitrogen Plasma Treatment

Author(s):

Publication title:

Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

97-25

Pub. Year:

1997

Page(from):

1559

Page(to):

1565

Pages:

7

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771788 [1566771781]

Language:

English

Call no.:

E23400/97-25

Type:

Conference Proceedings

Details

TDL ID:	ZA00013887
Series ID:	PA00000028
Conf. info. (Name):	International Conference on Chemical Vapor Deposition ; EUROCVD
Conf. info. (Number):	14th ; 11th
Conf. info. (Venue):	Paris, France
Conf. info. (Date):	1997.09.05-1997.09.09

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