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Effect of In Situ H2 Plasma Pretreatment on the Low Temeprature Microcrystalline (μc-Si:H) Silicon Film Deposited on Amorphous Si02 and SiNx:H Surfaces

Author(s):
Publication title:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-25
Pub. Year:
1997
Page(from):
1274
Page(to):
1281
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
Language:
English
Call no.:
E23400/97-25
Type:
Conference Proceedings

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