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The Analysis of Optimized Dopant Concentration Range in Borophosphosilicate Glass Films for VLSI and ULSI

Author(s):
Publication title:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-25
Pub. Year:
1997
Page(from):
1199
Page(to):
1206
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
Language:
English
Call no.:
E23400/97-25
Type:
Conference Proceedings

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