Blank Cover Image

Organometallic CVD of ss-CoGa and CoIn Thin Films from Organometallic Single Source Precursors

Author(s):
Publication title:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-25
Pub. Year:
1997
Page(from):
1034
Page(to):
1042
Pages:
9
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
Language:
English
Call no.:
E23400/97-25
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings ORGANOMETALLIC CVD OF CoGa AND RELATED BIMETALLIC THIN FILMS FROM NOVEL SINGLE SOURCE PRECURSORS

Fischer, Roland A.

Materials Research Society
7 Conference Proceedings Low-Temperature Deposition of ZrC Thin Films from a Single-Source Precursor

Smith, D.C., Healy, M.D., Rubiano, R.R., Springer, R.W.

Electrochemical Society
2 Conference Proceedings Organometallic Chemical Vapor Deposition of Group-III Nitride Thin Films Using Single-Source Precursors

Fischer, Roland A., Rogge, Wolfram

MRS - Materials Research Society
8 Conference Proceedings LOW-TEMPERATURE DEPOSITION OF ZrC THIN FILMS FROM A SINGLE-SOURCE PRECURSOR

Smith, David C., Rubiano, Rodrigo R., Healy, Matthew D., Springer, Robert W.

Materials Research Society
3 Conference Proceedings Growth kinetics of GaN thin films grown by OMVPE using single source precursors

Fischer, R. A., Wohlfart, A., Devi, A., Rogge, W.

MRS-Materials Research Society
9 Conference Proceedings Group III metal sulfide thin films from single-source precursors by chemical vapor deposition (CVD) techniques

Lazell, Mike R., O'Brien, Paul, Otway, David J., Park, Jin-Ho

MRS-Materials Research Society
4 Conference Proceedings Growth Kinetics and Mechanistic Studies of GaN Thin Films Grown by OMVPE Using (N3)2Ga[(CH2)3NMe2] as Single Source Precursor

Wohlforr, A., Devi, A., Rogge, W., Fischer, R.A., Schaefer, J., Wolfrum, J., Allendorf, M.D.

Electrochemical Society
10 Conference Proceedings Parametric Study of the CVD of YSZ from Organometallic Precursors

Varanasi, V., Besmann, T., Hyde, R., Xu, W., Starr, T.

Electrochemical Society
5 Conference Proceedings Volatile single source precursors for the MOCVD of metal silicate thin films

Patil, U., Becker, H. -W., Winter, M., Fischer, R. A., Devi, A.

Electrochemical Society
11 Conference Proceedings Nanoscale ZuS and CdS Thin Films from Single-Source Molecular Precursors

Armelao, L., Barreca, D., Bottaro, G., Gasparotto, A., Maragno, C., Sada, C., Spalding, T.R., Tondello, E.

Electrochemical Society
6 Conference Proceedings Low Temperature Chemical Vapor Deposition of Group-III-Nitrides

Fischer, R.A., Rogge, W.

Electrochemical Society
12 Conference Proceedings FERROELECTRIC THIN FILMS VIA SOL-GEL PROCESSING OF SINGLE-SOURCE PRECURSORS

Chandler, C. D., Hampden-Smith, M. J., Schwartz, R. W.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12