Effects of buried oxide and point defect saturation on redistribution of boron in thin-film silicon-on-insulator (TFSOI)
- Author(s):
- Publication title:
- Proceedings of the Eighth International Symposium on Silicon-on-Insulator Technology and Devices
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 97-23
- Pub. Year:
- 1997
- Page(from):
- 63
- Page(to):
- 68
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771764 [1566771765]
- Language:
- English
- Call no.:
- E23400/97-23
- Type:
- Conference Proceedings
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