A flow-channel cell for measurement of metallic contamination in silicon wafer processing

A flow-channel cell for measurement of metallic contamination in silicon wafer processing

Author(s):

Publication title:

Proceedings of the Symposium on Crystalline Defects and Contamination, their Impact and Control in Device Manufacturing II

Title of ser.:

Electrochemical Society Proceedings Series

Ser. no.:

97-22

Pub. Year:

1997

Page(from):

411

Page(to):

423

Pub. info.:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771757 [1566771757]

Language:

English

Call no.:

E23400/97-22

Type:

Conference Proceedings

Details

TDL ID:	ZA00013884
Series ID:	PA00000028
Conf. info. (Name):	Symposium on Crystalline Defects and Contamination ; Symposium on Silicon Cleaning Technology ; Meeting of the Electrochemical Society ; Annual Meeting of the International Society of Electrochemistry
Conf. info. (Number):	2nd ; 1997 ; 192nd ; 48th
Conf. info. (Venue):	Paris, France
Conf. info. (Date):	1997.08.31-1997.09.02

Similar Items:

1 Conference Proceedings Use of thermodynamical simulation to understand silicon/ metal interactions and avoid metallic contamination during silicon wafer annealings Mur, P., Pisch, A., Chatillon, C., Tarnowka, A., Semeria, M.N. Electrochemical Society	7 Conference Proceedings REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING Fyen, W., Holsteyns, F., Lauerhaas, J., Bearda, T., Mertens, P., Heyns, M. Electrochemical Society
2 Conference Proceedings ORGANIC CONTAMINATION ON SILICON WAFER SURFACES IN PROCESSING ENVIRONMENT Tanishima, M., Abe, N. Electrochemical Society	8 Conference Proceedings ASSESSMENT OF METALLIC TRACE CONTAMINANTS ON SILICON WAFER SURFACES rath, H. J., Stallhofer, P., Huber, D., Eichinger, P., Ruge, I. Materials Research Society
3 Conference Proceedings IONIC CONTAMINATION OF THE SILICON WAFER FROM WAFER CLEANING PROCESS Omoregie, H.O., Buffat, S.J., Sinha, D. Electrochemical Society	9 Conference Proceedings Silicon Surface Metal Contamination Measurements Using Grazing-Emission XRF Spectrometry Gendt, S. de, Kenis, K., Baeyens, M., Mertens, P. W., Heyns, M. M., Wiener, G., Kidd, S. J., Knotter, D. M., Bokx, P. K. … MRS - Materials Research Society
4 Conference Proceedings Influence of Cobalt Contamination in the Measurement of Diffusion Length of p-type CZ Silicon Wafers Pic, N., Polignano, M.L., Caputo, D., Salva, G., Sardo, M., Danel, A. SPIE-The International Society for Optical Engineering	10 Conference Proceedings METAL CONTAMINATION AND SILICON DAMAGE EFFECTS OF OXIDE PLASMA ETCH PROCESSES Vincs, L., Fujishiro, F., Echtle, D., Garcia, A., Han, Y.-P., Loh, Y.T., Delgado, M., Parmantie, W. Electrochemical Society
5 Conference Proceedings Influence of Cobalt Contamination in the Measurement of Diffusion Length of p-type CZ Silicon Wafers Pic, N., Polignano, M.L., Caputo, D., Salva, G., Sardo, M., Danel, A. Electrochemical Society	11 Conference Proceedings MANAGEMENT OF METALLIC CONTAMINATION IN ADVANCED IC MANUFACTURING A. Danel, D. Renaud, P. Besson, C. Bigot, A. Groujilet, J. P. Joly, M. Claes, T. Bearda, J. Frickinger Electrochemical Society
6 Conference Proceedings Metal Contamination from Process Materials Used in Wet Cleaning of Silicon Wafer D. Sinha Electrochemical Society	12 Conference Proceedings Detection of Metal Contamination in Intemally Gettered Wafers Polignano, M.L., Bacciaglia, P., Caputo, D., Clementi, C., Padovani, B., Priolo, F., Simpson, T. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12