Simulation of Plasma Etch Process Control on Etching Time-Scales: Multi-Coil Control of an Inductively Coupled Plasma Source
- Author(s):
Yang, J. Yamada, N. Ventzek, P.L.G. Sakai, Y. Date, H. Tagashira, H. Kitamori, K. - Publication title:
- Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 97-9
- Pub. Year:
- 1997
- Page(from):
- 233
- Page(to):
- 244
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771368 [1566771366]
- Language:
- English
- Call no.:
- E23400/97-9
- Type:
- Conference Proceedings
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