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Ultrathin MOS Gate Insulators: Surface Prepa-ration, Growth, and Interface Control

Author(s):
Nishioka, Y.
Komeda, T.
Namba, K.
Matsumura, M.
Sakoda, T.
Kubota, T.
Yamashita, Y.
Kobayashi, H.
3 more
Publication title:
Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
97-10
Pub. Year:
1997
Page(from):
347
Page(to):
362
Pages:
16
Pub. info.:
Pennington, New Jersey: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771375 [1566771374]
Language:
English
Call no.:
E23400/97-10
Type:
Conference Proceedings

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