Surface Development During Electroless Copper Deposition
- Author(s):
- Publication title:
- Proceedings of the Third Symposium on Electrochemically Deposited Thin Films
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 96-19
- Pub. Year:
- 1996
- Page(from):
- 91
- Page(to):
- 102
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771696 [1566771692]
- Language:
- English
- Call no.:
- E23400/970102
- Type:
- Conference Proceedings
Similar Items:
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Materials Research Society |
Elsevier |
9
Conference Proceedings
Surface Sensitivity & Precursor Formation During The Deposition Of TEOS/03 Thin Films
Electrochemical Society |
4
Conference Proceedings
Application of a Quartz Crystal Microbalance to the Study of Corrosion Inhibitors
Electrochemical Society |
Materials Research Society |
5
Conference Proceedings
Important Early Developments and Status of the IR Mechanism of Localized Corrosion
Electrochemical Society |
11
Conference Proceedings
Removal of copper oxide from copper surfaces using Q-switched Nd:YAG radiation at 1064 nm,532 nm,and 266 nm
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Electroless Metallization of Hydrogen-Terminated Si<100> Surface Functionalized by Viologen
Electrochemical Society |
Electrochemical Society |