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A study on Low Dielectric Material Deposition Using a Helicon Plasma Source

Author(s):
Choi, C-K.
Oh, Y.J.
Lee, K-M
Kim, J-H.
Chang, H-Y.
Kang, S-W.
1 more
Publication title:
Proceedings of the eleventh International Symposium on Plasma Processing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-12
Pub. Year:
1996
Page(from):
651
Page(to):
661
Pages:
11
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771641 [1566771641]
Language:
English
Call no.:
E23400/962354
Type:
Conference Proceedings

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