Blank Cover Image

Preparation of Ultrathin Oxide Films by Low-Temperature Remote Plasma-Assisted Process

Author(s):
Publication title:
Proceedings of the eleventh International Symposium on Plasma Processing
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
96-12
Pub. Year:
1996
Page(from):
623
Page(to):
630
Pages:
8
Pub. info.:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771641 [1566771641]
Language:
English
Call no.:
E23400/962354
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Differences between Interfacial Bonding Chemistry at SiC-SiO2 Interfaces Prepared by Low-Temperature Remote Plasma-Assisted Oxidation and High Temperature …

Lucovsky,G., Niimi,H.

Trans Tech Publications
7 Conference Proceedings LOW-TEMPERATURE DEVICE-QUALITY SiO2/Si (100) INTERFACES PREPARED BY A COMBINED REMOTE PLASMA OXIDATION-DEPOSITION PROCESS

Yasuda, T., ma, Y., Lucovsky, G.

Materials Research Society
2 Conference Proceedings Controlled Nitrogen Incorporation at Si-SiO2 Interfaces by Re- mote Plasma Assisted Processing

Koh, K., Niimi, H., Lucovsky, G.

Electrochemical Society
8 Conference Proceedings Bonded-H in Gate Dielectrics Deposited by Plasma Assisted Chemical Vapor Deposition and Subjected to Rapid Thermal Annealing

Lucovsky, G., Nimi, H., Koh, K.

MRS - Materials Research Society
3 Conference Proceedings Controlled Incorporation of Nitrogen at the Top Surface of Silicon Oxide Gate Dielectrics

Niimi, H., Koh, K., Lucovsky, G.

MRS - Materials Research Society
9 Conference Proceedings Electrical Performance of Stacked High-ti Gate Dielectrics: Remote Plasma CVD Ta2O5 and (Ta2O5)x(SiO2)1-x Alloys with Ultrathin Plasma Processed Si02 Interface …

Niimi, H., Johnson, R.S., Lucovsky, C., Massoud, H.Z.

Electrochemical Society
4 Conference Proceedings Integrated Processing of Silicon Oxynitride Alloy Dielectrics by Plasma-Assisted Oxidation, Chemical Vapor Deposition, and On-Line Rapid Thermal Annealing

Hattangady, S. V., Niimi, H., Gandhi, S., Lucovsky, G.

MRS - Materials Research Society
10 Conference Proceedings Cathodoluminescence Studies of Si-SiO2 Interfaces Prepared by Plasma-Assisted Oxidation and Subjected to Post-Oxidation Rapid Thermal Annealing

Schafer, J., Young, A. P., Brillson, L. J., Niimi, H., Lucovsky, G.

MRS - Materials Research Society
5 Conference Proceedings Hydrogen Assisted Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Nitride Films

Santos-Filho, P., Koh, K., Stevens, G., Lucovsky, G.

MRS - Materials Research Society
11 Conference Proceedings Ultrathin Silicon Oxide and Nitride - Silicon Interface States

Brillson, L. J., Young, A. P., Schafer, J., Niimi, H., Lucovsky, G.

MRS - Materials Research Society
6 Conference Proceedings Reaction Pathways for Nitrogen Incorporation at Si-SiO2 Interfaces

Koh, K., Niimi, H., Lucovsky, G.

MRS - Materials Research Society
12 Conference Proceedings SILICON OXYNITRIDE AND OXIDE-NITRIDE-OXIDE GATE DIELECTRICS BY CONBINED PLASMA-RAPID THERMAL PROCESSING

Ma, Y., Hattangady, S. V., Yasuda, T., Niimi, H., Gandhi, S., Lucovsky, G.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12