The Tuning of Nitride to Oxide Selectivity by Controlling CXHyF Flow, Pressure, and RF Power in the MxP+ Dielectric Etcher
- Author(s):
Li, Z. Lindley, R. Shan, H. Wang, J. Welch, M. Aguilar, J.A.P - Publication title:
- Proceedings of the eleventh International Symposium on Plasma Processing
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 96-12
- Pub. Year:
- 1996
- Page(from):
- 499
- Page(to):
- 504
- Pages:
- 6
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771641 [1566771641]
- Language:
- English
- Call no.:
- E23400/962354
- Type:
- Conference Proceedings
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